Gilad Vered

Title: The Innovations of Gilad Vered

Introduction

Gilad Vered is a notable inventor based in Giv'at Shmuel, Israel. He has made significant contributions to the field of semiconductor examination through his innovative patent. His work reflects a deep understanding of technology and its applications in modern industries.

Latest Patents

Gilad Vered holds a patent titled "Shape localization for examining a semiconductor specimen." This patent describes a system and method for examining a specimen that includes a first layer and a second layer. The method involves obtaining a recipe that includes a template image for each reference polygon in a reference image, as well as a template mask that indicates the proximity of a set of locations in the template image to the edge of the reference polygon. The process includes obtaining an inspection image in real-time, identifying first inspection polygons in the inspection image that correspond to the first reference polygons, and determining shifts for both layers to register the reference polygons with the inspection image.

Career Highlights

Gilad Vered is currently employed at Applied Materials Israel Limited, where he continues to develop and refine technologies related to semiconductor examination. His expertise and innovative approach have positioned him as a valuable asset in his field.

Collaborations

Gilad has collaborated with notable colleagues, including Dror Alumot and Uri Hadar. Their combined efforts contribute to advancements in semiconductor technology and innovation.

Conclusion

Gilad Vered's contributions to the field of semiconductor examination through his patent and work at Applied Materials Israel Limited highlight his role as an influential inventor. His innovative methods continue to shape the future of technology in this critical area.