Seoul, South Korea

Un Gyu Paik

USPTO Granted Patents = 5 

Average Co-Inventor Count = 6.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2008-2025

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5 patents (USPTO):Explore Patents

Title: Innovations by Un Gyu Paik: Pioneering CMP Slurry Technologies

Introduction: Un Gyu Paik is a prominent inventor based in Seoul, South Korea, known for his advancements in chemical-mechanical polishing (CMP) technologies. With four patents to his name, Paik has significantly contributed to improving the efficiency and effectiveness of CMP slurries used in semiconductor manufacturing.

Latest Patents: Among his latest patents, Un Gyu Paik developed a CMP slurry that comprises polishing particles made from organically modified colloidal silica. The patent details a comprehensive method of preparing this slurry through a series of steps that enhance its performance. This innovative slurry not only ensures a desired removal rate but also minimizes the occurrence of scratches on the substrate.

Another notable patent focuses on a slurry composition capable of compensating for the nanotopography effect on wafer surfaces. This invention includes a method for planarizing semiconductor device surfaces, where the size of abrasive particles and the concentration of additives are carefully controlled to maintain a consistent oxide layer thickness after polishing. These advancements mark significant progress in the semiconductor polishing processes.

Career Highlights: Throughout his career, Un Gyu Paik has been associated with reputable companies, contributing his expertise in CMP technologies. He has worked with K.C. Tech Co., Ltd. and Iucf-hyu, where he has played a crucial role in developing innovative solutions for the semiconductor industry.

Collaborations: Collaborating with fellow innovators such as Seok Min Hong and Jae Hyun Jeon, Un Gyu Paik has been at the forefront of research that combines diverse ideas and approaches to enhance CMP processes. These collaborations highlight the importance of teamwork in driving innovation.

Conclusion: Un Gyu Paik stands out as a distinguished inventor whose contributions to CMP slurry technology have helped shape the semiconductor manufacturing landscape. With his innovations, he continues to foster advancements that enhance efficiency and reliability in the industry.

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