Tung-Li Lee is a prominent inventor based in Jhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving processes and materials used in film deposition and implantation systems.

Latest Patents

One of his latest patents is titled "Method of making and using alloy susceptor with improved properties for film deposition." This patent describes a method for processing a wafer that involves an alloy susceptor with a treated exterior surface to enhance its roughness. The roughened surface is coated with a ceramic material, which improves the adhesion of film layers deposited on it. This innovation allows for better performance in wafer processing.

Another notable patent is "Preventing dosage drift with duplicate dose integrators." This invention provides a method for identifying drift in dose integrators within an implantation system. It includes a comparison between two dose integrators to detect any discrepancies, ensuring accurate dosage during the implantation process.

Career Highlights

Tung-Li Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing technologies that are critical for modern electronics.

Collaborations

He has collaborated with notable colleagues such as Kwun-Goo Hung and Ko-Chin Chung, contributing to various projects that enhance semiconductor manufacturing processes.

Conclusion

Tung-Li Lee's innovative patents and contributions to semiconductor technology highlight his expertise and commitment to advancing the field. His work continues to influence the industry and improve manufacturing techniques.

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