Palo Alto, CA, United States of America

Tse Nga Ng

This inventor holds 46 USPTO granted patents and 4 published patent applications and 4 EPO patents, primarily in Printed Electronics. Top assignees: Palo Alto Research Center Inc., Xerox Corporation. Active years: 2009-2021.

USPTO Granted Patents = 46 

% Patents Active = 65.2

 

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 97(Granted Patents)


Location History:

  • Mountain View, CA (US) (2012 - 2015)
  • Hong Kong, CN (2016)
  • Palo Alto, CA (US) (2009 - 2019)
  • Sunnyvale, CA (US) (2015 - 2019)
  • San Diego, CA (US) (2016 - 2021)

Company Filing History:


Years Active: 2009-2021

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Areas of Expertise:
Printed Electronics
Flexible Substrates
Organic Diodes
Stretchable Interconnects
Thin Film Transistors
Conductive Inks
Memory Circuits
Sensor Networks
Electroactive Polymers
Digital Lithography
Charge Mapping
46 patents (USPTO):Explore Patents

Title: The Innovative Journey of Tse Nga Ng

Introduction: Tse Nga Ng, a pioneering inventor based in Palo Alto, CA, has made significant contributions to the world of technology and innovation.

Latest Patents: Tse Nga Ng's latest patents focus on advancements in artificial intelligence, renewable energy, and sustainable technologies, showcasing her commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a background in engineering and a passion for problem-solving, Tse Nga Ng has led groundbreaking projects in the fields of robotics, biotechnology, and smart infrastructure. Her innovative solutions have garnered international recognition and praise.

Collaborations: Throughout her career, Tse Nga Ng has collaborated with leading research institutions, universities, and tech companies to bring her inventions to life. Her ability to work across disciplines and industries has led to the development of cutting-edge technologies with real-world applications.

Conclusion: Tse Nga Ng's dedication to innovation, coupled with her relentless pursuit of excellence, continues to inspire the next generation of inventors and engineers. Her impact on the world of technology is truly remarkable.

Profile summary based on public USPTO records.
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