The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Dec. 27, 2016
Applicant:
Palo Alto Research Center Incorporated, Palo Alto, CA (US);
Inventors:
Tse Nga Ng, Sunnyvale, CA (US);
Bing R. Hsieh, Pleasanton, CA (US);
Steven E. Ready, Los Altos, CA (US);
Assignee:
PALO ALTO RESEARCH CENTER INCORPORATED, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 33/44 (2006.01); B29C 33/52 (2006.01); B33Y 10/00 (2015.01); B29C 64/106 (2017.01); B29C 64/118 (2017.01); B29C 64/112 (2017.01); B29C 64/124 (2017.01); B29C 64/40 (2017.01); B29K 75/00 (2006.01);
U.S. Cl.
CPC ...
B33Y 10/00 (2014.12); B29C 33/448 (2013.01); B29C 64/106 (2017.08); B29C 64/112 (2017.08); B29C 64/118 (2017.08); B29C 64/124 (2017.08); B29C 64/40 (2017.08); B29K 2075/00 (2013.01);
Abstract
A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.