Travis Koh

This inventor holds 17 USPTO granted patents and 5 published patent applications, primarily in Plasma Processing. Top assignee: Applied Materials, Inc.. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Travis Koh. Retrieved from https://idiyas.com/inventor/travis-koh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 17 (Patent Applications = 5)

% Patents Active = 94.1

Average Co-Inventor Count = 5.6

ph-index = 6

Forward Citations = 290(Granted Patents)

Company Filing History:

17 out of 14,502

Applied Materials, Inc.

patents

Years Active: 2017-2026

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Areas of Expertise:

Ion Energy Distribution

Plasma Processing

Voltage Waveform

CVD Techniques

Pulsed Voltage

Tunable Workpiece Biasing

Magnetic Field Control

Inductively Coupled Plasma

Substrate Support

Radial Uniformity Tuning

Electrically Floating Power Supply

Selective Coil Excitation

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12620546 - Creating ion energy distribution functions (IEDF) (2026-05-05),

2. 12573588 - Plasma processing system configured to deliver a pulsed voltage waveform (2026-03-10),

3. 12456611 - Systems and methods for controlling a voltage waveform at a substrate during plasma processing (2025-10-28),

4. 12094707 - Plasma enhanced CVD with periodic high voltage bias (2024-09-17),

5. 11728124 - Creating ion energy distribution functions (IEDF) (2023-08-15),

6. 11069504 - Creating ion energy distribution functions (IEDF) (2021-07-20),

7. 10923320 - System for tunable workpiece biasing in a plasma reactor (2021-02-16),

8. 10904996 - Substrate support with electrically floating power supply (2021-01-26),

9. 10840086 - Plasma enhanced CVD with periodic high voltage bias (2020-11-17),

10. 10714372 - System for coupling a voltage to portions of a substrate (2020-07-14),

11. 10685807 - Creating ion energy distribution functions (IEDF) (2020-06-16),

12. 10373804 - System for tunable workpiece biasing in a plasma reactor (2019-08-06),

13. 10312048 - Creating ion energy distribution functions (IEDF) (2019-06-04),

14. 10249479 - Magnet configurations for radial uniformity tuning of ICP plasmas (2019-04-02),

15. 10115566 - Method and apparatus for controlling a magnetic field in a plasma chamber (2018-10-30),

Title: Innovator Spotlight: Travis Koh - Patent Leader in Plasma Processing Technologies

Introduction: Travis Koh, based in Sunnyvale, California, is a prominent inventor with a remarkable portfolio of 14 patents. His innovative contributions primarily focus on advanced plasma processing methods, showcasing his expertise in the field of semiconductor manufacturing.

Latest Patents: Among his latest inventions, Koh has worked on "Plasma Enhanced CVD with Periodic High Voltage Bias". This patent describes a method for processing substrates by flowing source gases into a chamber and inducing plasma from these gases, which is operated in a specific mode. Additionally, he has developed methods for "Creating Ion Energy Distribution Functions (IEDF)", utilizing shaped-pulse-bias to neutralize wafer surfaces and modulate voltages to achieve desired ion energy distributions.

Career Highlights: Koh is currently employed at Applied Materials, Inc., where he continues to push the boundaries of semiconductor technology. His ongoing work in the field highlights his dedication to innovation and excellence in patent development.

Collaborations: Throughout his career, Koh has collaborated with esteemed colleagues such as Philip Allan Kraus and Leonid Dorf. These partnerships have undoubtedly contributed to his success as an inventor and his ability to innovate within his industry.

Conclusion: Travis Koh stands out as a leading inventor whose patents significantly impact the field of plasma processing technologies. His collaboration with notable professionals and his dedication to advancing semiconductor manufacturing underscore the importance of innovation in shaping the future of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

5 patents pending: