The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Dec. 31, 2015
Applied Materials, Inc., Santa Clara, CA (US);
Joseph F. Aubuchon, San Jose, CA (US);
Tza-Jing Gung, San Jose, CA (US);
Travis Lee Koh, Sunnyvale, CA (US);
Nattaworn Boss Nunta, Standford, CA (US);
Sheng-Chin Kung, Milpitas, CA (US);
Steven Lane, Porterville, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Yang Yang, Los Gatos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments described herein generally relate to plasma process apparatus. In one embodiment, the plasma process apparatus includes a plasma source assembly. The plasma source assembly may include a first coil, a second coil surrounding the first coil, and a magnetic device disposed outside the first and inside the second coil. The magnet enables additional tuning which improves uniformity control of the processes on the substrate.