The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2021
Filed:
Sep. 20, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Travis Lee Koh, Sunnyvale, CA (US);
Haitao Wang, Fremont, CA (US);
Philip Allan Kraus, San Jose, CA (US);
Vijay D. Parkhe, San Jose, CA (US);
Daniel Distaso, Merrimac, MA (US);
Christopher A. Rowland, Rockport, MA (US);
Mark Markovsky, San Jose, CA (US);
Robert Casanova, San Jose, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments described herein generally relate to plasma assisted or plasma enhanced processing chambers. More specifically, embodiments herein relate to electrostatic chucking (ESC) substrate supports configured to provide pulsed DC voltage, and methods of applying a pulsed DC voltage, to a substrate during plasma assisted or plasma enhanced semiconductor manufacturing processes.