Tokyo, Japan

Toshihiko Takeda

USPTO Granted Patents = 135 


 

Average Co-Inventor Count = 4.4

ph-index = 24

Forward Citations = 1,745(Granted Patents)

Forward Citations (Not Self Cited) = 1,544(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Funabashi, JP (1994 - 1999)
  • Yamato-shi, JP (1999)
  • Shinjuku-Ku, JP (2001)
  • Kanagawa, JP (1994 - 2007)
  • Kanagawa-Ken, JP (2004 - 2009)
  • Atsugi, JP (1993 - 2010)
  • Yokohama, JP (1998 - 2012)
  • Ichikawa, JP (2011 - 2012)
  • Kawasaki, JP (2014)
  • Tokyo, JP (1990 - 2022)
  • Tokyo-to, JP (2011 - 2024)

Company Filing History:


Years Active: 1990-2025

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Areas of Expertise:
Vapor Chamber
Vapor Deposition Mask
Organic Semiconductor Device
Top-Emission Oled
Electron Emitting Device
Organic Electroluminescence
Manufacturing Method
Wick Sheet
Condensate Flow Paths
Stretching Apparatus
Multiple-Surface Imposition
Image Display Apparatus
135 patents (USPTO):Explore Patents

Title: Toshihiko Takeda: Revolutionary Innovator in Vapor Deposition Mask Technology

Introduction:

In the world of patents and innovations, Toshihiko Takeda has carved a name for himself as a visionary inventor. With a wealth of patents under his belt and a keen focus on vapor deposition mask technology, Takeda has significantly contributed to the field. This article explores Takeda's latest patents, career highlights, collaborations, and his overall impact on the industry.

Latest Patents:

Takeda's most recent patents highlight his ingenuity in the development and improvement of vapor deposition masks. One such invention is the "Vapor Deposition Mask with Metal Plate." This method revolutionizes the production of vapor deposition masks by combining a metal mask with a resin mask, enabling enhanced definition and reduced weight even at larger sizes.

Another notable patent is the "Method for Producing Frame-Equipped Vapor Deposition Mask." This method involves stretching the vapor deposition mask and aligning it precisely to a frame with the help of adjustments, ensuring accuracy during the production of organic semiconductor elements. Takeda's patents exemplify his relentless pursuit of perfection in vapor deposition mask technology.

Career Highlights:

Takeda's exceptional career in the field of innovations and patents encompasses collaborations with renowned companies. As a valued employee of Canon Kabushiki Kaisha, he contributed significantly to their research and development initiatives, particularly in the domain of vapor deposition masks. Takeda's expertise was also tapped by Dai Nippon Printingco., Ltd., where he continued to bring his visionary ideas to fruition.

Collaborations:

Throughout his prolific career, Takeda has had the privilege of working alongside esteemed colleagues. Katsunari Obata and Tetsuya Kaneko were among his coworkers, and their combined expertise and shared passion for innovation undoubtedly fueled extraordinary achievements in vapor deposition mask technology. These collaborations bear testament to Takeda's ability to inspire and collaborate with fellow inventors, creating new milestones together.

Conclusion:

Toshihiko Takeda's remarkable journey as an inventor and his extensive contributions to the realm of vapor deposition mask technology cannot be understated. With over 126 patents to his name, he has propelled the industry forward with his groundbreaking inventions. Takeda's dedication to improving vapor deposition masks, evident in his recent patents, underscores his unwavering commitment to excellence. Through his notable career highlights and productive collaborations, Takeda has left an indelible mark in the field, inspiring future innovators and revolutionizing the way we approach vapor deposition mask technology.

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