The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2021
Filed:
Feb. 19, 2018
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a method for producing a vapor deposition mask and a vapor deposition mask preparation body capable of simply producing the vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal maskin which a plurality of slitsare provided and a resin maskare stacked. Openingsrequired for composing a plurality of screens are provided in the resin mask. The openingscorrespond to a pattern to be produced by vapor deposition. Each of the slitsis provided at a position of overlapping with an entirety of at least one screen.