The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Dec. 28, 2023
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Shinichiro Takahashi, Tokyo-to, JP;

Takayuki Ota, Tokyo-to, JP;

Kazunori Oda, Tokyo-to, JP;

Toshihiko Takeda, Tokyo-to, JP;

Kiyotaka Takematsu, Tokyo-to, JP;

Terutoshi Momose, Tokyo-to, JP;

Yoko Nakamura, Tokyo-to, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F28D 15/00 (2006.01); F28D 15/02 (2006.01); H05K 7/20 (2006.01);
U.S. Cl.
CPC ...
H05K 7/20318 (2013.01); F28D 15/0233 (2013.01); F28D 15/0266 (2013.01);
Abstract

A vapor chamber in which an enclosed space is formed, and a working fluid is sealed in this space, the enclosed space including: a plurality of condensate flow paths through which a fluid that is the working fluid in a condensing state flows; and vapor flow paths through which a vapor that is the working fluid in a vaporizing state flows, wherein each of projecting parts with which each of the vapor flow paths is provided has a projecting amount varying in an extending direction of the vapor flow paths; a pitch for opening parts that allow the vapor flow paths and the condensate flow paths to communicate varies in the extending direction of the vapor flow paths; or wall parts that separate the flow paths each have a given relationship with a transverse cross section of a given flow path.


Find Patent Forward Citations

Loading…