Toshiaki Kitano

Title: Toshiaki Kitano: Innovator in Semiconductor Technology

Introduction

Toshiaki Kitano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His innovative work has paved the way for advancements in electronic devices and materials.

Latest Patents

One of his latest patents is a semiconductor device that includes a base member with a protruding portion at the circumferential edge. This semiconductor device is designed to feature a base member made of semiconductor material in a thin plate shape. It includes a front face electrode placed on the front surface of the base member and a rear face electrode that covers the rear surface. Additionally, a via hole is formed, allowing electrical connection between the front and rear face electrodes. Notably, a protrusion portion is disposed at the circumferential edge of the base member, enhancing its structural integrity. Another significant patent involves a nitride semiconductor layer provided on a silicon substrate, which includes a gate electrode, source electrode, and drain electrode, along with a P-type conductive layer in contact with the nitride semiconductor layer.

Career Highlights

Throughout his career, Toshiaki Kitano has worked with notable companies such as Mitsubishi Denki Kabushiki Kaisha and Mitsubishi Electric Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Toshiaki has collaborated with esteemed colleagues, including Hiroyuki Okazaki and Kenichiro Kurahashi. Their joint efforts have further advanced the field of semiconductor devices and technologies.

Conclusion

Toshiaki Kitano's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative designs continue to influence the development of electronic devices.