Taipei Hsien, Taiwan

Tong-Hsin Lee


Average Co-Inventor Count = 1.3

ph-index = 6

Forward Citations = 103(Granted Patents)


Company Filing History:


Years Active: 1999-2003

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19 patents (USPTO):Explore Patents

Title: Innovations of Tong-Hsin Lee in Semiconductor Technology

Introduction

Tong-Hsin Lee is a prominent inventor based in Taipei Hsien, Taiwan, known for his contributions to semiconductor technology. With an impressive portfolio of 19 patents, he has developed innovative methods that significantly advance the field of transistor fabrication.

Latest Patents

Among his latest patents, the method of forming a MOS transistor with improved threshold voltage stability stands out. This innovative approach involves utilizing the gate of a transistor as a mask to create a lightly doped drain. By employing a low thermal budget deposition process, a silicon nitride layer is formed on the semiconductor substrate's surface. The subsequent ion implantation of fluorine atoms into the silicon nitride layer, followed by an etching process to form a spacer, enhances threshold voltage stability by preventing interface trapped charges through bonding with hydrogen atoms.

Another significant patent by Lee is the method of fabricating gate oxide. This process begins with the formation of a mask layer on a substrate, which is then patterned to create a trench. The method involves removing a portion of the mask layer to expose the substrate at the trench's top edge corner. An insulation layer is used to fill the trench and cover the exposed substrate, leading to a controlled oxidation rate that results in a thicker gate oxide at the top edge corner than elsewhere.

Career Highlights

Tong-Hsin Lee has worked with notable organizations such as United Microelectronics Corporation and United Silicon Incorporated. His experiences in these esteemed companies have honed his skills in semiconductor research and development, enabling him to make significant contributions in the industry.

Collaborations

Throughout his career, Lee has collaborated with fellow researchers like Terry Chung-Yi Chen and Shih-Chien Hsu. These collaborations have resulted in a synergistic exchange of ideas and further advancements in semiconductor technology.

Conclusion

In summary, Tong-Hsin Lee's innovative methods and significant contributions to the semiconductor field, as evident from his 19 patents, have played a vital role in enhancing transistor technology. His work continues to inspire and influence the ever-evolving landscape of semiconductor innovation.

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