Tokyo, Japan

Tomoshi Inoue



Average Co-Inventor Count = 5.3

ph-index = 4

Forward Citations = 553(Granted Patents)


Location History:

  • Ohta-ku, JP (2011)
  • Tokyo, JP (2011 - 2023)

Company Filing History:


Years Active: 2011-2023

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9 patents (USPTO):

Title: The Innovative Contributions of Tomoshi Inoue

Introduction

Tomoshi Inoue is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of substrate polishing. With a total of nine patents to his name, Inoue's work has had a substantial impact on the industry.

Latest Patents

One of Inoue's latest patents is a method and apparatus for polishing a substrate. This innovative polishing method is designed for achieving a flat mirror finish on substrates such as semiconductor wafers. The method involves a polishing apparatus that includes a polishing table with a polishing surface, a top ring for holding and pressing the substrate against the polishing surface, and a vertically movable mechanism for adjusting the height of the top ring. The top ring is initially moved to a first height before the substrate is pressed against the polishing surface, and then it is adjusted to a second height after the substrate is in contact with the polishing surface.

Career Highlights

Inoue has built a successful career at Ebara Corporation, where he has been instrumental in advancing polishing technologies. His expertise and innovative approaches have positioned him as a key figure in the semiconductor industry.

Collaborations

Throughout his career, Inoue has collaborated with notable colleagues, including Makoto Fukushima and Tetsuji Togawa. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Tomoshi Inoue's contributions to the field of semiconductor manufacturing through his innovative polishing methods and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.

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