The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2012

Filed:

Aug. 19, 2008
Applicants:

Hozumi Yasuda, Tokyo, JP;

Tetsuji Togawa, Tokyo, JP;

Osamu Nabeya, Tokyo, JP;

Kenichiro Saito, Tokyo, JP;

Makoto Fukushima, Tokyo, JP;

Tomoshi Inoue, Tokyo, JP;

Inventors:

Hozumi Yasuda, Tokyo, JP;

Tetsuji Togawa, Tokyo, JP;

Osamu Nabeya, Tokyo, JP;

Kenichiro Saito, Tokyo, JP;

Makoto Fukushima, Tokyo, JP;

Tomoshi Inoue, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.


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