Location History:
- Masala, FI (2008)
- Espoo, FI (2015 - 2024)
Company Filing History:
Years Active: 2008-2025
Title: The Innovative Contributions of Timo Malinen
Introduction
Timo Malinen, based in Espoo, Finland, is a notable inventor with an impressive portfolio of 16 patents. His work predominantly focuses on high-technology processes and apparatuses, particularly in the field of atomic layer deposition and substrate processing. Malinen's innovative ideas have contributed significantly to advancements in these areas.
Latest Patents
Timo Malinen holds several recent patents, showcasing his expertise and vision in technological innovation. One of his latest patents is titled "Atomic Layer Deposition with Plasma Source." This invention relates to a method for operating a plasma atomic layer deposition reactor designed to deposit material onto substrates via sequential self-saturating surface reactions. It involves allowing gas from an inactive gas source to flow into a widening radical inflow part that opens towards the reaction chamber throughout the entire deposition cycle. Additionally, he has developed a "Substrate Processing Apparatus and Method," which includes a reaction chamber for processing substrates, a photon source for providing reactive photons, and a specialized chemical inlet and outlet system.
Career Highlights
Timo Malinen has worked with renowned companies in the industry, including Picosun Oy and Kp-Tekno Oy. His contributions in these companies have helped advance the development of cutting-edge technologies related to his patents. His innovative approaches and engineering skill set have made him a valuable asset in the field.
Collaborations
Throughout his career, Timo has collaborated with several notable professionals, including Juhana Kostamo and Wei-Min Li. These collaborations have facilitated idea exchange and fostered innovation in the possession of advanced material deposition techniques and equipment.
Conclusion
Timo Malinen stands out as a prominent inventor whose contributions to atomic layer deposition and substrate processing continue to influence the technological landscape. With 16 patents to his name, he is paving the way for future advancements in the field through his inventive spirit and collaborative efforts. His work exemplifies the importance of innovation in the pursuit of technological excellence.