The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Nov. 25, 2015
Applicant:
Picosun Oy, Espoo, FI;
Inventors:
Timo Malinen, Espoo, FI;
Juhana Kostamo, Espoo, FI;
Wei-Min Li, Espoo, FI;
Tero Pilvi, Helsinki, FI;
Assignee:
Picosun Oy, Espoo, FI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/48 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/45536 (2013.01); C23C 16/45574 (2013.01); C23C 16/45578 (2013.01); C23C 16/48 (2013.01); C23C 16/482 (2013.01); C23C 16/483 (2013.01);
Abstract
A method that includes performing an atomic layer deposition sequence including at least one deposition cycle, each cycle producing a monolayer of deposited material, the deposition cycle including introducing at least a first precursor species and a second precursor species to a substrate surface in a reaction chamber, wherein both of said first and second precursor species are present in gas phase in said reaction chamber simultaneously.