The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Apr. 07, 2011
Vaino Kilpi, Espoo, FI;
Wei-min LI, Espoo, FI;
Timo Malinen, Espoo, FI;
Juhana Kostamo, Espoo, FI;
Sven Lindfors, Espoo, FI;
Vaino Kilpi, Espoo, FI;
Wei-Min Li, Espoo, FI;
Timo Malinen, Espoo, FI;
Juhana Kostamo, Espoo, FI;
Sven Lindfors, Espoo, FI;
PICOSUN OY, Espoo, FI;
Abstract
A deposition reactor includes an in-feed part that defines an expansion space which leads reactants as a top to bottom flow from a plasma source towards a reaction chamber, the expansion space widening towards the reaction chamber, and a lifting mechanism for loading at least one substrate to the reaction chamber from the top side of the reaction chamber. The deposition reactor deposits material on the at least one substrate in the reaction chamber by sequential self-saturating surface reactions.