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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9868131 B1

PDFFull Text
Date of Patent:
Jan. 16, 2018

Filed:

Jul. 08, 2015

Atomic layer deposition with plasma source

Applicant:

Picosun Oy, Espoo, FI;

Inventors:

Vaino Kilpi, Espoo, FI;

Wei-Min Li, Espoo, FI;

Timo Malinen, Espoo, FI;

Juhana Kostamo, Espoo, FI;

Sven Lindfors, Espoo, FI;

Assignee:

Picosun Oy, Espoo, FI;

Attorney:

Harrington & Smith

Primary Examiner:

Mandy Louie

Int. Cl.
CPC ...
C23C 16/455 (2006.01); B05C 5/00 (2006.01); C23C 16/52 (2006.01); C23C 16/40 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
B05C 5/001 (2013.01); C23C 16/403 (2013.01); C23C 16/45542 (2013.01); C23C 16/45544 (2013.01); C23C 16/45582 (2013.01); C23C 16/52 (2013.01); H01J 37/32357 (2013.01); H01J 37/32449 (2013.01); H01J 37/32743 (2013.01); H01J 37/32871 (2013.01); H01L 21/02274 (2013.01);
Abstract

The invention relates to method including operating a plasma atomic layer deposition reactor configured to deposit material in a reaction chamber on at least one substrate by sequential self-saturating surface reactions, and allowing gas from an inactive gas source to flow into a widening radical in-feed part opening towards the reaction chamber substantially during a whole deposition cycle. The invention also relates to a corresponding apparatus.

Find Patent Forward Citations

Kilpi, Vaino. (2018). Atomic layer deposition with plasma source (U.S. Patent No. 9868131). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9868131

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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