Hsin-Chu, Taiwan

Tien I Bao


Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2002-2012

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7 patents (USPTO):Explore Patents

Title: Tien I Bao: Innovator in Low Dielectric Constant Materials

Introduction

Tien I Bao is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor materials, particularly in the development of low dielectric constant materials. With a total of 7 patents to his name, Bao's work has had a substantial impact on the industry.

Latest Patents

One of Tien I Bao's latest patents focuses on a two-step post-deposition treatment of interlayer dielectric (ILD) layers to achieve a lower dielectric constant while improving mechanical properties. This innovative method involves curing a deposited layer of carbon-doped oxide, HSQ, or MSQ and treating it with helium plasma. This treatment enhances the hardness of the layer for subsequent chemical mechanical polishing (CMP) steps and effectively lowers the dielectric constant without losing hydroxyl (HO) or carbon-hydrogen (CH) during the process. Following this, the low k dielectric layer undergoes treatment with hydrogen plasma, which converts some of the Si—O and Si—CH bonds near the surface to Si—H bonds. This further reduces the dielectric constant and increases thermal stability, thereby improving breakdown resistance and reducing moisture uptake. This method is particularly beneficial for interconnect schemes with deep sub-micron ground rules. Surprisingly, the k value achieved from the two different plasma treatments is lower than that obtained from two helium treatments or two hydrogen treatments.

Career Highlights

Tien I Bao is currently associated with Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Tien I Bao has collaborated with notable colleagues, including Syun-Ming Jang and Hui-Lin Chang. These collaborations have further enriched his research and development efforts.

Conclusion

In summary, Tien I Bao is a distinguished inventor whose work in low dielectric constant materials has significantly influenced the semiconductor industry. His innovative approaches and collaborations continue to drive advancements in technology.

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