The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2003

Filed:

Nov. 09, 2001
Applicant:
Inventors:

Bi-Trong Chen, Taiwan, TW;

Lain-Jong Li, Hualien, TW;

Syun-Ming Jang, Hsin-Chu, TW;

Shu E Ku, Miadi, TW;

Tien I. Bao, Hsin-Chu, TW;

Lih-Ping Li, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; H01L 2/100 ;
U.S. Cl.
CPC ...
B44C 1/22 ; H01L 2/100 ;
Abstract

In accordance with the objectives of the invention a new method is provided for improving adhesion strength that is deposited over the surface of a layer of copper. Conventional etch stop layers of for instance dichlorosilane (SiCl H ) or SiOC have poor adhesion with an underlying layer of copper due to poor molecular binding between the interfacing layers. The surface of the deposited layer of copper can be provided with a special enhanced interface layer by using a method provided by the invention. That is pre-heat of the copper layer followed by a pre-cleaning treatment with ammonia (NH ) and N , followed by forming an adhesive enhanced layer over the copper layer by treatment with N or O or N with alkyl-silane or alkyl silane.


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