Company Filing History:
Years Active: 2005-2013
Title: Tien-Chih Chang: Innovator in Semiconductor Technology
Introduction
Tien-Chih Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on improving the performance and efficiency of integrated circuits.
Latest Patents
Among his latest patents is the "Relaxed silicon germanium substrate with low defect density." This patent describes a structure for an integrated circuit that includes a crystalline substrate and four crystalline layers. The first crystalline layer, which has a first lattice constant, is positioned on the crystalline substrate. The second crystalline layer has a second lattice constant that differs from the first and is placed on the first crystalline layer. The third crystalline layer has a third lattice constant that is different from the second and is positioned on the second crystalline layer. Additionally, the strained fourth crystalline layer includes, at least partially, a MOSFET device. Another notable patent is a method of forming a strained silicon layer on a relaxed, low defect density semiconductor alloy layer such as SiGe.
Career Highlights
Tien-Chih Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has contributed to advancements in semiconductor materials and device structures.
Collaborations
He has collaborated with notable colleagues, including Mong-Song Liang and Liang-Gi Yao, further enhancing the impact of his research and inventions.
Conclusion
Tien-Chih Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in integrated circuit design and manufacturing.