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For the Inventor, By the Inventor

Niigata, Japan

Tetsuo Aoyama

This inventor holds 32 USPTO granted patents, primarily in Semiconductor Cleaning. Top assignees: Mitsubishi Gas Chemical Company, Inc., Mitsubishi Denki Kabushiki Kaisha, Mitsubishi Gas Chemical, Inc.. Active years: 1977-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuo Aoyama. Retrieved from https://idiyas.com/inventor/tetsuo-aoyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32

% Patents Active = 96.9

Average Co-Inventor Count = 4.4

ph-index = 14

Forward Citations = 622(Granted Patents)


Location History:

  • Tokyo, JA (1977)
  • Niigata, JA (1978)
  • Niigata-ken, JP (1998 - 2004)
  • Niigata, JP (1979 - 2005)

Company Filing History:

goldMedal24 out of 2,304 
 
Mitsubishi Gas Chemical Company, Inc.
 patents
silverMedal1 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents
bronzeMedal1 out of 6 
 
Mitsubishi Gas Chemical, Inc.
 patents
4. 1 out of 25,954 
 
Sharp Kabushiki Kaisha Corporation
 patents
5. 1 out of 10,904 
 
Tokyo Electron Limited
 patents
6. 6 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1977-2005

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Areas of Expertise:
Cleaning Agent
Photoresist Stripping
Semiconductor Device
Resist Stripping
Oxidizing Agent
Thin Film Circuit
Aqueous Solution
Active Carbon Materials
Surface Treatment
Positive Developer
Dimethyl Formamide
Carboxylic Acid Esters
32 patents (USPTO):Explore Patents
1. 6875288 - Cleaning agent and cleaning method (2005-04-05),
2. 6686322 - Cleaning agent and cleaning process using the same (2004-02-03),
3. 6638694 - Resist stripping agent and process of producing semiconductor devices using the same (2003-10-28),
4. 6514352 - Cleaning method using an oxidizing agent, chelating agent and fluorine compound (2003-02-04),
5. 6500270 - Resist film removing composition and method for manufacturing thin film circuit element using the composition (2002-12-31),
6. 6462005 - Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device (2002-10-08),
7. 6458517 - Photoresist stripping composition and process for stripping photoresist (2002-10-01),
8. 6440326 - Photoresist removing composition (2002-08-27),
9. 6372410 - Resist stripping composition (2002-04-16),
10. 6265309 - Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same (2001-07-24),
11. 6199567 - Method and apparatus for manufacturing semiconductor device (2001-03-13),
12. 5972862 - Cleaning liquid for semiconductor devices (1999-10-26),
13. 5962385 - Cleaning liquid for semiconductor devices (1999-10-05),
14. 5911836 - Method of producing semiconductor device and rinse for cleaning (1999-06-15),
15. 5846695 - Removing agent composition for a photoresist and process for producing a (1998-12-08),

Title: The Innovative Journey of Tetsuo Aoyama

Introduction: Tetsuo Aoyama, a distinguished inventor hailing from Niigata-ken, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Tetsuo Aoyama's recent patents focus on advancements in renewable energy technologies, particularly in the development of solar power systems that are more efficient and cost-effective.

Career Highlights: With a career spanning over two decades, Aoyama has been at the forefront of cutting-edge research in the renewable energy sector. His work has not only garnered international recognition but has also revolutionized the way we harness and utilize clean energy sources.

Collaborations: Throughout his career, Tetsuo Aoyama has collaborated with leading research institutions, universities, and tech companies to further his research and bring his innovative ideas to life. His collaborative efforts have resulted in the successful implementation of several groundbreaking projects.

Conclusion: Tetsuo Aoyama's relentless pursuit of innovation and his passion for creating a sustainable future have solidified his position as a trailblazer in the field of renewable energy technology. His work continues to inspire and shape the future of clean energy solutions worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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