The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2002

Filed:

Oct. 21, 1998
Applicant:
Inventors:

Masahiro Nohara, Mie-ken, JP;

Yukihiko Takeuchi, Mie-ken, JP;

Taimi Oketani, Mie-ken, JP;

Taketo Maruyama, Niigata-ken, JP;

Tetsuya Karita, Niigata-ken, JP;

Hisaki Abe, Niigata-ken, JP;

Tetsuo Aoyama, Niigata-ken, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23G 1/00 ;
U.S. Cl.
CPC ...
C23G 1/00 ;
Abstract

A resist film removing composition used in the manufacture of a thin film circuit element having an organic insulation film which comprises 50 to 70% by weight of an alkanolamine having 3 or more carbon atoms, 20 to 30% by weight of a water-miscible solvent and 10 to 20% by weight of water. The resist film removing composition can easily remove a resist film remaining after etching, without swelling the organic insulation film.


Find Patent Forward Citations

Nohara, Masahiro. (2002). Resist film removing composition and method for manufacturing thin film circuit element using the composition (U.S. Patent No. 6500270). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6500270

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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