Niigata, Japan

Tetsuya Karita

This inventor holds 4 USPTO granted patents. Top assignees: Mitsubishi Gas Chemical Company, Inc., Other. Active years: 1998-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Karita. Retrieved from https://idiyas.com/inventor/tetsuya-karita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 3

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 1998-2002

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4 patents (USPTO):Explore Patents

Title: Tetsuya Karita: Innovator in Photoresist Technologies

Introduction

Tetsuya Karita is an accomplished inventor based in Niigata-ken, Japan. With a total of four patents to his name, he has significantly contributed to the field of thin film technologies and photoresist compositions, showcasing his expertise in innovative materials and manufacturing methods.

Latest Patents

One of his notable patents is the "Resist film removing composition and method for manufacturing thin film circuit element using the composition." This invention pertains to a resist film removing composition designed for manufacturing thin film circuit elements that include an organic insulation film. The composition consists of 50 to 70% by weight of an alkanolamine with three or more carbon atoms, 20 to 30% by weight of a water-miscible solvent, and 10 to 20% by weight of water. This innovative solution effectively removes a resist film after etching without causing any swelling of the organic insulation film.

Another significant patent by Tetsuya is the "Photoresist removing composition," which comprises a quaternary ammonium hydroxide, a water-soluble amine, an alkylpyrrolidone, and a sugar or sugar alcohol. This composition is capable of efficiently removing a photoresist layer from an inorganic substrate, effectively dealing with remaining photoresist after dry etching or ashing. It operates at low temperatures in a short time, facilitating hyperfine processing of wiring pattern materials to create high-precision circuit patterns without causing material corrosion.

Career Highlights

Throughout his career, Tetsuya Karita has worked with several prominent companies, including Mitsubishi Gas Chemical Company, Inc. His experience in these settings has allowed him to refine his skills and develop groundbreaking technologies in the area of photoresist compositions.

Collaborations

Tetsuya has collaborated with notable professionals in the field, including colleagues Tetsuo Aoyama and Taketo Maruyama. These partnerships have enabled him to push the boundaries of innovation and contribute to advancements in the industry.

Conclusion

Tetsuya Karita's contributions to the world of thin film technologies and photoresist compositions make him a significant figure in the field of innovations and inventions. His latest patents showcase his dedication to improving manufacturing processes and transforming the creation of circuit patterns, underscoring his role as a leading inventor in his domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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