Osaka, Japan

Masahiro Nohara

This inventor holds 4 USPTO granted patents. Top assignees: Kanto Kagaku Kabushiki Kaisha, Other. Active years: 2002-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Nohara. Retrieved from https://idiyas.com/inventor/masahiro-nohara-hwql44pd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 75.0

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Mie-ken, JP (2002)
  • Osaka, JP (2002 - 2015)

Company Filing History:


Years Active: 2002-2015

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4 patents (USPTO):Explore Patents

Title: The Innovative Mind of Masahiro Nohara

Introduction

Masahiro Nohara, an esteemed inventor based in Osaka, Japan, has significantly contributed to the field of semiconductor and display technologies. With a total of four patents to his name, Nohara's work emphasizes the importance of innovative solutions for the manufacturing processes in these sectors.

Latest Patents

Nohara's latest contributions include two noteworthy patents. The first patent involves etching solution compositions designed for metal laminate films. This invention utilizes fluorine compounds and iron ions to enhance the bulk etching process for layers of aluminum and titanium alloys. The second patent outlines a cleaning agent and its corresponding cleaning process. This cleaning agent, which contains an oxidizing agent and a chelating agent, is particularly effective at removing residues formed during the production of semiconductor integrated circuits and liquid crystal display panels, ensuring minimal corrosion to essential wiring and insulating materials.

Career Highlights

Throughout his career, Masahiro Nohara has demonstrated a commitment to advancing technology and improving manufacturing processes. His work has garnered attention for its practicality and application in modern electronics. Nohara's expertise in chemical compositions and integrated circuit fabrication places him at the forefront of innovation in his field.

Collaborations

Nohara has worked alongside notable colleagues, including Hisaki Abe and Taketo Maruyama. Their collaborations have fostered a creative environment that has led to significant advancements in their respective projects, further supporting the development and implementation of Nohara's patented technologies.

Conclusion

Masahiro Nohara's inventive spirit and dedication to his work continue to propel advancements in semiconductor and display technologies. As he moves forward, his ongoing research and patented solutions will likely contribute to further innovations in the industry, solidifying his status as a prominent figure in the realm of modern invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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