The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2003

Filed:

Oct. 09, 2001
Applicant:
Inventors:

Hideto Gotoh, Ibaraki, JP;

Takayuki Niuya, Ibaraki, JP;

Hiroyuki Mori, Yamanashi, JP;

Hiroshi Matsunaga, Ibaraki, JP;

Fukusaburo Ishihara, Saitama, JP;

Yoshiya Kimura, Ibaraki, JP;

Ryuji Sotoaka, Ibaraki, JP;

Takuya Goto, Ibaraki, JP;

Tetsuo Aoyama, Niigata, JP;

Kojiro Abe, Niigata, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 ;
U.S. Cl.
CPC ...
C23G 1/02 ;
Abstract

The cleaning method described above is characterized by allowing a cleaning agent comprising an oxidizing agent, a chelating agent and fluorine compound to flow on a surface of a material to be treated at a high speed to thereby clean the above surface according to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.


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Gotoh, Hideto. (2003). Cleaning method using an oxidizing agent, chelating agent and fluorine compound (U.S. Patent No. 6514352). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6514352

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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