Teruyoshi Yao

Title: Teruyoshi Yao: Innovator in Lithographic Technology

Introduction

Teruyoshi Yao is a prominent inventor based in Kawasaki, Japan, known for his significant contributions to lithographic technology. With a total of 11 patents to his name, Yao has made remarkable advancements in the field, particularly in the area of mask pattern correction devices.

Latest Patents

Yao's latest patents include a mask pattern correction device, a method of correcting mask patterns, a light exposure correction device, and a method of correcting light exposure. These innovations aim to realize a lithographic process that allows for the estimation and correction of flare with extremely high accuracy. This technology minimizes dimensional variations in width across both single shot regions and entire chip regions. The mask pattern correction device features a numerical aperture calculation unit that calculates flare energy for a mask pattern corresponding to a transferred pattern, taking into account the exposure layout of multiple shot regions.

Career Highlights

Throughout his career, Teruyoshi Yao has worked with notable companies such as Fujitsu Corporation and Fujitsu Semiconductor Limited. His work has significantly impacted the development of advanced lithographic processes, enhancing the precision and efficiency of semiconductor manufacturing.

Collaborations

Yao has collaborated with esteemed colleagues, including Morimi Osawa and Satoru Asai, contributing to the advancement of technology in their respective fields.

Conclusion

Teruyoshi Yao's innovative work in lithographic technology has established him as a key figure in the industry. His patents reflect a commitment to enhancing the accuracy and efficiency of semiconductor processes, making a lasting impact on the field.