The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2013
Filed:
Jun. 04, 2012
Teruyoshi Yao, Kawasaki, JP;
Satoru Asai, Kawasaki, JP;
Morimi Osawa, Kawasaki, JP;
Hiromi Hoshino, Kawasaki, JP;
Kouzou Ogino, Kawasaki, JP;
Kazumasa Morishita, Kasugai, JP;
Teruyoshi Yao, Kawasaki, JP;
Satoru Asai, Kawasaki, JP;
Morimi Osawa, Kawasaki, JP;
Hiromi Hoshino, Kawasaki, JP;
Kouzou Ogino, Kawasaki, JP;
Kazumasa Morishita, Kasugai, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
In view of realizing a lithographic process which makes it possible to estimate and correct flare with an extremely high accuracy, and causes only an extremely small dimensional variation in width, over the entire portion not only of a single shot region, but also of a single chip region, a mask pattern correction device of the present invention has a numerical aperture calculation unit calculating, for every single shot region, flare energy for a mask pattern corresponding to a transferred pattern, based on an exposure layout of a plurality of shot regions, or more specifically, while considering flare from a plurality of shot regions located around every single shot region.