Company Filing History:

5 out of 1,674

Fujitsu Semiconductor Limited

Fujitsu Microelectronics Limited

patents

Years Active: 2004-2013

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8553198 - Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure (2013-10-08),

2. 8227153 - Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure (2012-07-24),

3. 7971160 - Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask (2011-06-28),

4. 7870520 - Semiconductor device and yield calculation method (2011-01-11),

5. 7732107 - Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure (2010-06-08),

6. 7601471 - Apparatus and method for correcting pattern dimension and photo mask and test photo mask (2009-10-13),

7. 7240307 - Pattern size correcting device and pattern size correcting method (2007-07-03),

8. 7205078 - Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method (2007-04-17),

9. 6862726 - Light intensity simulation method, program product, and designing method of photomask (2005-03-01),

10. 6677089 - Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method (2004-01-13),

Title: Morimi Osawa: Innovator in Lithographic Technology

Introduction

Morimi Osawa is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of lithography, particularly in the development of technologies that enhance the accuracy of mask pattern correction and light exposure.

Latest Patents

Osawa holds a total of 10 patents. His latest innovations include a mask pattern correction device and a method of correcting mask patterns. Additionally, he has developed a light exposure correction device and a method for correcting light exposure. These inventions aim to realize a lithographic process that allows for the estimation and correction of flare with extremely high accuracy, while minimizing dimensional variations across both single shot and chip regions.

Career Highlights

Throughout his career, Morimi Osawa has worked with notable companies such as Fujitsu Semiconductor Limited and Fujitsu Corporation. His work has been instrumental in advancing lithographic technologies that are crucial for semiconductor manufacturing.

Collaborations

Osawa has collaborated with esteemed colleagues, including Satoru Asai and Teruyoshi Yao. Their combined expertise has contributed to the success of various projects in the field of lithography.

Conclusion

Morimi Osawa's innovative work in lithographic technology has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing the precision and efficiency of semiconductor manufacturing processes.

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