The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2009
Filed:
Jun. 21, 2005
Morimi Osawa, Kawasaki, JP;
Teruyoshi Yao, Kawasaki, JP;
Hiroshi Arimoto, Kawasaki, JP;
Satoru Asai, Kawasaki, JP;
Morimi Osawa, Kawasaki, JP;
Teruyoshi Yao, Kawasaki, JP;
Hiroshi Arimoto, Kawasaki, JP;
Satoru Asai, Kawasaki, JP;
Fujitsu Microelectronics Limited, Tokyo, JP;
Abstract
The width values of transferred patterns of respective evaluation patterns transferred using a test photo mask () are calculated by first calculation unit () based on the relationship with the opening ratio of flare generation patterns. The distribution of the calculated width values of the respective transferred patterns is linearly approximated by second calculation unit () and the inclination thereof is calculated. On the basis of a table defining the inclination of the width values of the respective transferred patterns (the ratio of dimension fluctuation), the amount of correction is changed for each pattern by correction unit (). Consequently, the amount of dimension fluctuation caused by local flares can be accurately calculated. This enables accurately performing pattern-dimension corrections against local flares.