Kouzou Ogino

Title: Kouzou Ogino: Innovator in Lithographic Technology

Introduction

Kouzou Ogino is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of lithographic technology, particularly in the area of mask pattern correction. With a total of 3 patents to his name, Ogino's work has advanced the precision and accuracy of lithographic processes.

Latest Patents

Ogino's latest patents include a mask pattern correction device and a method of correcting mask patterns. These innovations aim to realize a lithographic process that allows for the estimation and correction of flare with extremely high accuracy. His inventions also ensure minimal dimensional variation in width across both single shot regions and entire chip regions. The mask pattern correction device features a numerical aperture calculation unit that calculates flare energy for a mask pattern corresponding to a transferred pattern. This calculation is based on the exposure layout of multiple shot regions, taking into account flare from surrounding shot regions.

Career Highlights

Kouzou Ogino is currently employed at Fujitsu Semiconductor Limited, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His expertise in lithography has positioned him as a key player in the industry, contributing to advancements that enhance the performance and reliability of semiconductor devices.

Collaborations

Ogino has worked alongside talented colleagues such as Kazumasa Morishita and Satoru Asai. Their collaborative efforts have further propelled innovations in the field, fostering an environment of creativity and technical excellence.

Conclusion

Kouzou Ogino's contributions to lithographic technology exemplify the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to precision and accuracy, paving the way for future advancements in lithography.