Itami, Japan

Taro Nishiguchi

This inventor holds 37 USPTO granted patents and 53 published patent applications and 2 EPO patents, primarily in Silicon Carbide Technology. Top assignee: Sumitomo Electric Industries, Limited. Active years: 2012-2026.

USPTO Granted Patents = 37 

% Patents Active = 91.9

 

Average Co-Inventor Count = 3.5

ph-index = 6

Forward Citations = 123(Granted Patents)


Location History:

  • Hyogo, JP (2019 - 2020)
  • Itami, JP (2012 - 2022)
  • Osaka, JP (2017 - 2024)

Company Filing History:


Years Active: 2012-2026

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Areas of Expertise:
Silicon Carbide
Epitaxial Substrate
Semiconductor Device
Crystal Ingot
Single Crystal
Grooves
Dislocation
Wafer
Stack
Manufacturing Method
Semiconductor Substrate
Light-Emitting Device
37 patents (USPTO):Explore Patents

Title: Innovations of Taro Nishiguchi in Silicon Carbide Technology

Introduction: Taro Nishiguchi, based in Itami, Japan, has established himself as a prominent inventor in the field of semiconductor technology. With a commendable portfolio of 35 patents, he has made significant contributions, particularly in the area of silicon carbide epitaxial substrates.

Latest Patents: Nishiguchi's latest innovations include two noteworthy patents focusing on silicon carbide epitaxial substrates. The first patent describes a silicon carbide epitaxial substrate that consists of a silicon carbide substrate, a first silicon carbide epitaxial layer, and a second silicon carbide epitaxial layer. This structure ensures that the carrier concentration of the silicon carbide substrate is higher than that of the epitaxial layers, enhancing performance in semiconductor applications. The second patent outlines a method for manufacturing a silicon carbide semiconductor device, detailing a substrate design that emphasizes optimal carrier concentration and thickness, along with minimal roughness and haze in the central region of the layer.

Career Highlights: Taro Nishiguchi's career is highlighted by his tenure at Sumitomo Electric Industries, Limited, where he has played an integral role in advancing silicon carbide technology. His dedication to innovation has not only bolstered his reputation as an inventor but has also contributed to the company's success in the semiconductor sector.

Collaborations: Nishiguchi collaborates closely with fellow researchers and engineers, including Shin Harada and Shinsuke Fujiwara. Together, they pursue breakthroughs in semiconductor technology, leveraging their combined expertise to tackle challenges in the field.

Conclusion: Taro Nishiguchi's contributions to silicon carbide technology through his numerous patents exemplify his status as a leading inventor. His work not only enhances the capabilities of semiconductor devices but also showcases the importance of innovation in driving technological advancements. As he continues to develop new solutions, the impact of his inventions will surely resonate within the industry for years to come.

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