The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2021

Filed:

Oct. 11, 2016
Applicant:

Sumitomo Electric Industries, Ltd., Osaka, JP;

Inventors:

Keiji Wada, Itami, JP;

Tsutomu Hori, Itami, JP;

Taro Nishiguchi, Itami, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/00 (2006.01); C30B 29/36 (2006.01); C30B 25/20 (2006.01); H01L 21/02 (2006.01); C23C 16/32 (2006.01); C30B 25/18 (2006.01); H01L 21/04 (2006.01); H01L 21/78 (2006.01); H01L 29/04 (2006.01); H01L 29/16 (2006.01); H01L 29/34 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
C30B 29/36 (2013.01); C23C 16/325 (2013.01); C30B 25/183 (2013.01); C30B 25/20 (2013.01); H01L 21/0262 (2013.01); H01L 21/02378 (2013.01); H01L 21/02433 (2013.01); H01L 21/02447 (2013.01); H01L 21/02499 (2013.01); H01L 21/02529 (2013.01); H01L 21/02576 (2013.01); H01L 21/02609 (2013.01); H01L 21/046 (2013.01); H01L 21/049 (2013.01); H01L 21/0485 (2013.01); H01L 21/78 (2013.01); H01L 29/045 (2013.01); H01L 29/1608 (2013.01); H01L 29/34 (2013.01); H01L 29/66068 (2013.01); H01L 29/7802 (2013.01);
Abstract

A silicon carbide epitaxial substrate includes a silicon carbide single crystal substrate and a silicon carbide layer. In a direction parallel to a central region, a ratio of a standard deviation of a carrier concentration of the silicon carbide layer to an average value of the carrier concentration of the silicon carbide layer is less than 5%. The average value of the carrier concentration is more than or equal to 1×10cmand less than or equal to 5×10cm. In the direction parallel to the central region, a ratio of a standard deviation of a thickness of the silicon carbide layer to an average value of the thickness of the silicon carbide layer is less than 5%. The central region has an arithmetic mean roughness (Sa) of less than or equal to 1 nm. The central region has a haze of less than or equal to 50.


Find Patent Forward Citations

Loading…