Tao Long

Title: The Innovative Contributions of Tao Long

Introduction

Tao Long is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor technology. With a total of eight patents to his name, he has made remarkable advancements that have impacted the industry.

Latest Patents

Among his latest patents is a method of fabricating a semiconductor structure. This method involves forming a first diffusion layer on a first electrode layer and creating a core layer over the first diffusion layer. A second diffusion layer is then formed over the core layer, followed by the formation of a plurality of diffusion regions within the second diffusion layer. Additionally, a second electrode layer is established over the second diffusion layer, which is in contact with the diffusion regions. The substrate is sandwiched between the first and second electrode layers. Another notable patent is a method that includes providing a substrate with a first conductivity type, diffusing impurities to create a first diffusion layer, and forming a second diffusion layer with a second conductivity type. This method also involves creating a square groove ring in the substrate and forming a glass layer over it, along with the necessary electrode layers.

Career Highlights

Tao Long has worked with Diodes Inc., where he has applied his expertise in semiconductor fabrication. His work has contributed to the development of innovative technologies that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Tao Long has collaborated with notable colleagues, including Pin-Hao Huang and Ze Rui Chen. These collaborations have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Tao Long's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to shape the future of the industry.