The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2025

Filed:

Jul. 16, 2024
Applicant:

Diodes Incorporated, Plano, TX (US);

Inventors:

Tao Long, Shanghai, CN;

Ze Rui Chen, Plano, TX (US);

Pin-Hao Huang, New Taipei, TW;

Bau-Shun Huang, New Taipei, TW;

Lee Spencer Riley, Lancashire, GB;

Assignee:

DIODES INCORPORATED, Plano, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 23/58 (2006.01); H01L 27/102 (2023.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/8725 (2013.01); H01L 23/585 (2013.01); H01L 27/1021 (2013.01); H01L 29/0623 (2013.01); H01L 29/66143 (2013.01);
Abstract

A semiconductor structure includes: a substrate, having a cell region and a terminal region, and having a first surface, a second located in the terminal region, and a third surface located in the cell region, the second surface and the third surface being located at different levels; a first trench structure, located in the cell region, traversing the third surface to extend towards the first surface, including a first semiconductor material layer and a first oxide layer partially protruding from the third surface, and extending in a first direction parallel to the third surface; and a second trench structure, located in the cell region, including a second semiconductor material layer and a second oxide layer partially protruding from the third surface, and extending parallel to the first direction, wherein the third surface is provided with a doped region between the first trench structure and the second trench structure.


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