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For the Inventor, By the Inventor

Kawasaki, Japan

Takuya Ohhashi

USPTO Granted Patents = 9

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal9 out of 1,233 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 2012-2024

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9 patents (USPTO):Explore Patents
1. 11898081 - Ruthenium-etching solution, method for manufacturing ruthenium-etching solution, method for processing object to be processed, and method for manufacturing ruthenium-containing wiring (2024-02-13),
2. 11120994 - Etching solution, and method of producing semiconductor element (2021-09-14),
3. 10242875 - Impurity diffusion agent composition and method for manufacturing semiconductor substrate (2019-03-26),
4. 9856382 - Homogeneous coating solution and production method thereof, light-absorbing layer of solar cell and production method thereof, and solar cell and production method thereof (2018-01-02),
5. 9535330 - Stripping solution for photolithography and pattern formation method (2017-01-03),
6. 9133352 - Surface treatment agent and surface treatment method (2015-09-15),
7. 8802610 - Cleaning liquid and anticorrosive agent comprising a mercapto compound and solvent (2014-08-12),
8. 8354365 - Cleaning liquid for lithography and method for forming wiring (2013-01-15),
9. 8206509 - Cleaning liquid for lithography and method for forming wiring (2012-06-26),

Title: Takuya Ohhashi: Innovator in Ruthenium-Etching Solutions

Introduction

Takuya Ohhashi is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative work on ruthenium-etching solutions. With a total of 9 patents to his name, Ohhashi continues to push the boundaries of technology.

Latest Patents

Ohhashi's latest patents include a ruthenium-etching solution designed for etching processes on ruthenium. This etching solution comprises orthoperiodic acid and ammonia, maintaining a pH level between 8 and 10. Additionally, he has developed methods for manufacturing this etching solution, processing objects that require etching, and creating ruthenium-containing wiring. Another notable patent involves a SiGe compound etching solution that selectively etches compounds represented by the general formula SiGe, utilizing periodic acid and fluoride.

Career Highlights

Takuya Ohhashi is currently employed at Tokyo Ohka Kogyo Co., Ltd., where he applies his expertise in developing advanced etching solutions. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Ohhashi collaborates with talented colleagues, including Takahiro Eto and Daijiro Mori, to further innovate in the field of semiconductor technology. Their combined efforts contribute to the advancement of etching solutions and manufacturing methods.

Conclusion

Takuya Ohhashi's contributions to the field of semiconductor manufacturing through his innovative patents and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.

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