Location History:
- Soka, JP (2016)
- Saitama, JP (2012 - 2022)
- Tokyo, JP (2008 - 2023)
Company Filing History:
9 out of 101 
1 out of 2,467 
1 out of 58,131 
Years Active: 2008-2023
Title: Takuo Ohwada: Innovator in Ruthenium Removal and Etching Technologies
Introduction
Takuo Ohwada is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of materials science, particularly in the development of compositions for removing ruthenium and etching methods. With a total of nine patents to his name, Ohwada's work has had a considerable impact on various industrial applications.
Latest Patents
One of his latest patents is a composition for removing ruthenium. This invention addresses the challenge of effectively removing ruthenium (Ru) from substrates while preventing the evolution of RuO gas. The remover composition has a pH of 8 or higher at 25°C and includes one or more pH buffer ingredients. Another significant patent is an etchant composition and method for etching. This etchant is designed for batch etching treatment of tungsten and titanium nitride films, utilizing a composition that includes nitric acid and water.
Career Highlights
Throughout his career, Takuo Ohwada has worked with prominent companies such as Kanto Kagaku and NEC Electronics Corporation. His experience in these organizations has allowed him to refine his expertise in chemical compositions and etching technologies.
Collaborations
Ohwada has collaborated with notable colleagues, including Norio Ishikawa and Yumiko Taniguchi. Their combined efforts have contributed to advancements in the field of materials science.
Conclusion
Takuo Ohwada's innovative work in ruthenium removal and etching technologies showcases his significant contributions to the industry. His patents reflect a commitment to solving complex challenges in materials science, making him a respected figure in his field.