The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Dec. 23, 2020
Applicant:
Kanto Kagaku Kabushiki Kaisha, Tokyo, JP;
Inventors:
Ryou Kouno, Saitama, JP;
Takuo Ohwada, Saitama, JP;
Assignee:
KANTO KAGAKU KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/26 (2006.01); H01L 21/3213 (2006.01); H01L 21/308 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23F 1/26 (2013.01); H01L 21/308 (2013.01); H01L 21/3213 (2013.01); H01L 21/32134 (2013.01); H01L 21/768 (2013.01);
Abstract
An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided. The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.