Location History:
- Tokyo, JP (2013)
- Saitama, JP (2022)
Company Filing History:
Years Active: 2013-2022
Title: Ryou Kouno: Innovator in Etching Solutions
Introduction
Ryou Kouno is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of etching solutions, holding a total of 2 patents. His work focuses on developing compositions and methods that enhance the etching process for various materials.
Latest Patents
Kouno's latest patents include an etchant composition and method for etching. The first patent describes an etchant composition that enables batch etching treatment of tungsten and titanium nitride films. This composition consists of nitric acid and water, providing an efficient solution for etching these materials. The second patent addresses an etching solution composition for metal thin films primarily consisting of copper. This invention aims to achieve high accuracy in etching metal-laminated film patterns, ensuring excellent pattern shapes and stable characteristics over time. The etching method utilizes a solution comprising phosphoric acid, nitric acid, acetic acid, and water.
Career Highlights
Ryou Kouno is associated with Kanto Kagaku Kabushiki Kaisha, where he applies his expertise in etching technologies. His innovative approaches have contributed to advancements in the field, particularly in the semiconductor industry.
Collaborations
Kouno has collaborated with notable coworkers, including Kenji Ohshiro and Hideki Takahashi. Their combined efforts have fostered a creative environment that encourages innovation and development in etching solutions.
Conclusion
Ryou Kouno's contributions to etching technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the field and provide effective solutions for industry applications.