Tokyo, Japan

Takeshi Sakurai

USPTO Granted Patents = 15 


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 100(Granted Patents)


Location History:

  • Urawa, JP (1992)
  • Omiya, JP (1993)
  • Yono, JP (1995)
  • Fujisawa, JP (2002)
  • Yokohama, JP (2001 - 2005)
  • Tokyo, JP (1985 - 2020)

Company Filing History:


Years Active: 1985-2020

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15 patents (USPTO):Explore Patents

Title: Innovations of Takeshi Sakurai

Introduction

Takeshi Sakurai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate cleaning technology, holding a total of 15 patents. His work has been instrumental in advancing the efficiency and effectiveness of substrate processing.

Latest Patents

Among his latest patents are a substrate cleaning device, a substrate cleaning apparatus, a method for manufacturing cleaned substrates, and a substrate processing apparatus. The substrate cleaning device includes a substrate holding unit designed to hold a substrate, a first cleaning unit with a cleaning member that contacts the substrate's surface to clean it, and a second cleaning unit with a similar function. A controller is integrated to manage the operation of both cleaning units, ensuring that while one member cleans the substrate, the other remains at a safe distance.

Career Highlights

Takeshi has worked with notable companies such as Ebara Corporation and the International Superconductivity Technology Center. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in substrate cleaning technology.

Collaborations

He has collaborated with esteemed colleagues, including Shoji Tanaka and Kaoru Hamaura, to further enhance his inventions and drive technological advancements in their field.

Conclusion

Takeshi Sakurai's innovative work in substrate cleaning technology has established him as a key figure in the industry. His patents reflect a commitment to improving manufacturing processes and enhancing the quality of substrates.

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