Tokyo, Japan

Takashi Nishida


Average Co-Inventor Count = 4.0

ph-index = 11

Forward Citations = 429(Granted Patents)


Location History:

  • Taito, JP (1988)
  • Taitou, JP (1984 - 1993)
  • Tokyo, JP (1979 - 2010)

Company Filing History:


Years Active: 1979-2010

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18 patents (USPTO):Explore Patents

Title: Takashi Nishida: Pioneering Technology Innovations in Tokyo

Introduction: Takashi Nishida is a renowned inventor based in Tokyo, Japan, with a remarkable dedication to pushing the boundaries of technology and a passion for creating solutions to complex problems. With 18 patents to his name, Nishida is a true visionary in the world of inventions.

Latest Patents: Among his latest patents is a groundbreaking "Semiconductor Device and Manufacturing Method" that focuses on enhancing the peripheral length of an aperture and the mechanical strength of cylinders in a cell. By incorporating innovative techniques such as forming a slit in the middle of each mask pattern, Nishida has successfully increased the efficiency and strength of semiconductor devices without compromising on design intricacies.

Career Highlights: Nishida has made significant contributions to the tech industry through his work at esteemed companies such as Hitachi, Ltd. and Hitachi VLSI Engineering Corp. His expertise in semiconductor technology has led to a series of groundbreaking inventions that have reshaped the landscape of modern electronics.

Collaborations: Throughout his career, Nishida has collaborated with talented individuals such as Eiji Takeda and Tokuo Kure, further enriching his innovative spirit and bringing forth revolutionary ideas in the field of technology.

Conclusion: Takashi Nishida's relentless pursuit of excellence and his knack for solving complex technological challenges have established him as a trailblazer in the world of inventions. His visionary approach to innovation continues to inspire future generations of inventors and solidify his legacy as a true pioneer in the realm of technology.

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