Niigata, Japan

Takashi Ishikawa

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 19(Granted Patents)

Forward Citations (Not Self Cited) = 10(Sep 21, 2024)

Location History:

  • Ichikawa, JP (1990 - 1998)
  • Niigata, JP (2003 - 2023)
  • Kitakanbara-gun, JP (2024)
  • Iwanai-gun, JP (2024)


Years Active: 1990-2025

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: Takashi Ishikawa - Innovator in Silicon Wafer and Magnetic Powder Technologies

Introduction

Takashi Ishikawa is a prominent inventor based in Niigata, Japan, known for his significant contributions to the fields of silicon wafer production and rare earth-iron-nitrogen-based magnetic powders. With a total of 9 patents to his name, Ishikawa has made remarkable advancements that have impacted various industries.

Latest Patents

Ishikawa's latest patents include a method for producing silicon wafers, which are Czochralski wafers formed of silicon. This innovation features a bulk layer with an oxygen concentration of 0.5×10/cm or more, and a surface layer extending to 300 nm in depth with an oxygen concentration of 2×10/cm or more. Additionally, he has developed a rare earth-iron-nitrogen-based magnetic powder, which contains a rare-earth element, iron, and nitrogen, with specific particle size and composition parameters. This magnetic powder is designed to enhance performance in various applications.

Career Highlights

Throughout his career, Takashi Ishikawa has worked with notable companies such as Sumitomo Metal Mining Company, Ltd. and Globalwafers Japan Co., Ltd. His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking technologies.

Collaborations

Ishikawa has collaborated with esteemed

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