Tokyo, Japan

Takao Tamura

This inventor holds 23 USPTO granted patents and 4 published patent applications, primarily in Vehicle Control Systems. Top assignees: Nec Corporation, Honda Motor Co., Ltd., Honda Motor Ltd., Ltd.. Active years: 1996-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takao Tamura. Retrieved from https://idiyas.com/inventor/takao-tamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 91.3

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 50(Granted Patents)


Location History:

  • Tokyo, JP (1996 - 2003)
  • Wako, JP (2023 - 2024)

Company Filing History:


Years Active: 1996-2026

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Areas of Expertise:
Vehicle Control Device
Driving Mode
Road Line Angle
Travel Control Apparatus
Electron Beam Drawing
Charged Particle Beams
Projection Lithography
Pattern Drawing Method
Coulomb Correction
Exposure System
Metal Wirings
23 patents (USPTO):Explore Patents

Title: The Innovative Journey of Takao Tamura

Introduction

Takao Tamura, based in Tokyo, Japan, is a distinguished inventor recognized for his contributions to the field of electron beam technology. With a remarkable portfolio of 11 patents, he has made significant strides in developing advanced processes and methodologies that enhance the precision of micropatterning techniques.

Latest Patents

Among his latest patents is a groundbreaking invention regarding **cell projection using an electron beam**. This process involves a trial exposure of a test wafer utilizing cell apertures to facilitate the cell projection of a target wafer. By comparing design differences and actual differences between the exposure areas, an offset value is derived, which is instrumental in correcting stitching errors incurred by the projection system.

Another noteworthy patent is the **method of preparing charged particle beam drawing data and recording medium on which the program thereof is recorded**. This method focuses on creating drawing pattern data used in charged particle beam drawing apparatuses, which form micropatterns by converting CAD data. The process includes verification through interlayer calculation to identify discrepancies between CAD data and drawing apparatus pattern data. If such a difference is detected, compensatory drawing pattern data is generated to ensure precision.

Career Highlights

Takao Tamura has established a reputable career working at esteemed companies, particularly with NEC Corporation and NEC Electronics Corporation. His roles in these organizations have allowed him to push the boundaries of innovation in electron beam technology, which has profound implications for various industries.

Collaborations

In his career journey, Tamura has closely collaborated with notable individuals including Hiroshi Yamashita and Hiroshi Nozue. Their teamwork has undoubtedly fueled advancements in the areas of their expertise, leading to new and inventive solutions within the field.

Conclusion

With a strong foundation in electron beam technology and a commitment to innovation, Takao Tamura continues to inspire the industry with his patents and collaborative efforts. His work not only showcases the power of creativity and engineering but also paves the way for future developments in the realm of micropatterning and charged particle beam processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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