The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
May. 17, 2000
Applicant:
Inventor:
Takao Tamura, Tokyo, JP;
Assignee:
NEC Electronics Corporation, Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7256 ; H01J 3/730 ; G03F 9/00 ;
U.S. Cl.
CPC ...
H01J 3/7256 ; H01J 3/730 ; G03F 9/00 ;
Abstract
An electron-beam cell projection process uses a trial exposure of a test wafer by using cell apertures for use in the cell projection of the target wafer. A design difference and an actual difference between both the areas for exposure are compared against each other to obtain an offset value, which is used for the actual cell projection for correction of a stitching error caused by the projection system.
Tamura, Takao. (2003). Cell projection using an electron beam (U.S. Patent No. 6649920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6649920
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile