The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Aug. 19, 1998
Applicant:
Inventor:
Takao Tamura, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ; G06K 9/00 ;
U.S. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ; G06K 9/00 ;
Abstract
In a charged particle beam drawing data preparing method of preparing drawing pattern data used in a charged particle beam drawing apparatus that forms a micropattern with a charged particle by converting CAD data, it is verified by using interlayer calculation whether a difference exists between the CAD data and the drawing pattern data. When it is verified that a difference exists between the CAD data and the drawing apparatus pattern data, drawing pattern data that compensates for this difference is generated by using interlayer calculation.
Tamura, Takao. (2001). Method of preparing charged particle beam drawing data and recording medium on which program thereof is recorded (U.S. Patent No. 6317866). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6317866
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