Takakazu Kiyomura

USPTO Granted Patents = 11 (Patent Applications = 4)

Average Co-Inventor Count = 2.1

ph-index = 3

Forward Citations = 34(Granted Patents)

Location History:

Hiroshima, JP (2010)
Chuo-ku, JP (2012)
Tokyo, JP (2008 - 2014)

Company Filing History:

Tokyo Electron Limited

Konica-minolta Holdings, Inc.

patents

where one patent can have more than one assignee

Years Active: 2008-2014

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11 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8735304 - Film forming method, film forming apparatus, and storage medium (2014-05-27),

2. 8679913 - Method for Sr—Ti—O-based film formation (2014-03-25),

3. 8508020 - Method for manufacturing semiconductor device (2013-08-13),

4. 8357583 - Method for manufacturing semiconductor device (2013-01-22),

5. 8288241 - Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition method (2012-10-16),

6. 8283227 - Method for manufacturing semiconductor memory device (2012-10-09),

7. 7872328 - Capacitor electrode that contains oxygen and nitrogen (2011-01-18),

8. 7847328 - Capacitor electrode, method for manufacturing the same, and semiconductor device (2010-12-07),

9. 7786539 - Dieletric film layered product (2010-08-31),

10. 7740917 - Method for forming thin film and base and having thin film formed by such method (2010-06-22),

11. 7442627 - Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer (2008-10-28),

Title: Takakazu Kiyomura: Innovator in Film Formation Technology

Introduction

Takakazu Kiyomura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film formation technology, holding a total of 11 patents. His innovative approaches have advanced the development of dielectric films, which are crucial in various electronic applications.

Latest Patents

Kiyomura's latest patents include a film forming method and apparatus, as well as a storage medium. One notable method involves forming a dielectric film that includes a zirconium oxide film. This process entails supplying a zirconium material and an oxidant to create the film on a substrate. Additionally, he has developed a method for Sr–Ti–O-based film formation, ensuring a specific atomic ratio of strontium to titanium in the film. This method includes multiple film forming steps and utilizes oxidizing agents for optimal results.

Career Highlights

Throughout his career, Kiyomura has worked with notable companies such as Elpida Memory, Inc. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his expertise in film formation technologies and contribute to groundbreaking advancements in the field.

Collaborations

Kiyomura has collaborated with esteemed colleagues, including Toshiyuki Hirota and Yuichiro Morozumi. These partnerships have fostered a creative environment that has led to innovative solutions in film technology.

Conclusion

Takakazu Kiyomura's contributions to film formation technology exemplify his dedication to innovation. His patents and collaborations reflect a commitment to advancing the field, making him a significant figure in the realm of inventions.

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