Company Filing History:
Years Active: 2022-2025
Title: The Innovative Contributions of Takahisa Okuno
Introduction
Takahisa Okuno is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on advanced materials and methods that enhance the performance and efficiency of semiconductor substrates.
Latest Patents
Okuno's latest patents include a laminate and release agent composition, as well as a method for manufacturing processed semiconductor substrates. One notable patent describes a laminate that consists of a semiconductor substrate, a UV-ray-transmissive support substrate, and an adhesive layer with a release layer positioned between the semiconductor substrate and the support substrate. The release layer is crafted from a releasing agent composition that includes a polymer of an ethylenic unsaturated monomer featuring a tert-butoxycarbonyl group, a photoacid generator, and a solvent. Another significant patent details an adhesive composition designed for peeling off through light irradiation. This composition is characterized by its ability to achieve debonding via light exposure and contains an adhesive component and a light-absorbing organic compound, which includes aromatic rings and groups such as carbonyl and thiocarbonyl.
Career Highlights
Takahisa Okuno is currently employed at Nissan Chemical Corporation, where he continues to innovate and develop new technologies. His expertise in semiconductor materials has positioned him as a key figure in the industry, contributing to advancements that have practical applications in various electronic devices.
Collaborations
Okuno has collaborated with notable colleagues, including Shunsuke Moriya and Hiroshi Ogino. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Takahisa Okuno's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in materials science and semiconductor manufacturing.
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