Toyama, Japan

Takaaki Noda

USPTO Granted Patents = 36 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 448(Granted Patents)


Location History:

  • Tokyo, JP (2004 - 2005)
  • Toyama, JP (2009 - 2024)

Company Filing History:


Years Active: 2004-2024

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36 patents (USPTO):Explore Patents

Title: Unveiling the Inventive Genius of Takaaki Noda from Toyama, Japan

Introduction:

Takaaki Noda, a prominent inventor hailing from Toyama, Japan, has left an indelible mark in the world of semiconductor technology and substrate processing methods. With an impressive portfolio of 32 patents, his innovative spirit and technical prowess have garnered recognition and admiration in the industry.

Latest Patents:

Among his notable patents is the "Method of manufacturing semiconductor device, recording medium, and substrate processing method." This revolutionary method involves the formation of a film with first and second layers laminated on a substrate. The intricate process includes specific temperature controls and sequential actions to ensure precise layering without thermal decomposition of the materials involved.

Career Highlights:

Takaaki Noda has made significant contributions during his tenure at Hitachi-Kokusai Electric Inc. and Kokusai Electric Corporation. His expertise and groundbreaking inventions have helped advance the field of semiconductor manufacturing and substrate processing, establishing him as a key figure in the industry.

Collaborations:

Throughout his career, Takaaki Noda has collaborated with esteemed professionals, including Yoshiro Hirose and Tsukasa Kamakura. Their collective efforts have led to groundbreaking innovations and have elevated the standards of excellence within the industry.

Conclusion:

In conclusion, Takaaki Noda's relentless pursuit of innovation and commitment to excellence have solidified his position as a visionary inventor in the realm of semiconductor technology. His inventive spirit continues to inspire future generations of inventors and researchers, shaping the landscape of technological advancement for years to come.

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