Suwon, South Korea

Tae Wook Seo

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignees: Ips Corporation, Samsung Electronics Co., Ltd., Integrated Process Systems Ltd.. Active years: 2002-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae Wook Seo. Retrieved from https://idiyas.com/inventor/tae-wook-seo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 66.7

Average Co-Inventor Count = 2.8

ph-index = 2

Forward Citations = 29(Granted Patents)


Location History:

  • Suwon, KR (2002)
  • Kyungki-do, KR (2002 - 2007)
  • Pyungtaek, KR (2009)
  • Suwon-si, KR (2010)

Company Filing History:


Years Active: 2002-2010

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6 patents (USPTO):Explore Patents

Title: **Innovator Tae Wook Seo: Advancing Semiconductor Manufacturing**

Introduction

Tae Wook Seo, an accomplished inventor from Suwon-si, South Korea, has made significant strides in the field of semiconductor manufacturing. With a remarkable portfolio of six patents, he has contributed innovative methods that enhance the efficiency and quality of thin film deposition processes.

Latest Patents

Seo's latest patents include a "Method of Depositing Thin Film" and a "Method of Manufacturing Semiconductor Using the Same." These patents introduce methods characterized by high selectivity and enhanced etching resistance while maintaining a low extinction coefficient associated with anti-reflectivity. The techniques involve the deposition of a carbon anti-reflective film on a substrate's bottom film, followed by incorporating compounds containing nitrogen (N), fluorine (F), or silicon (Si). This process results in the formation of thin films, such as a-C:N, a-C:F, or a-C:Si, with thicknesses ranging from 1 to 100 nm through an atomic layer deposition process, achieving an ultrathin film with improved etching resistance.

Another significant innovation introduced by Seo includes a method for continuously depositing thin films in a single chamber, allowing for precise control of process gaps between a gas injection unit and substrate. This method streamlines the production of Ti and TiN thin films, resulting in increased efficiency and quality in semiconductor manufacturing.

Career Highlights

Throughout his career, Tae Wook Seo has worked with several prestigious companies, including Ips Corporation and Samsung Electronics Co., Ltd. His experience in these leading organizations has equipped him with a profound understanding of semiconductor technology and manufacturing processes, allowing him to develop cutting-edge solutions in this domain.

Collaborations

Seo's work has also involved collaborations with notable peers, such as Young Hoon Park and Sahng Kyoo Lee. These partnerships have fostered an environment of innovation and creativity, leading to the development of groundbreaking methods and technologies in the semiconductor industry.

Conclusion

In summary, Tae Wook Seo stands out as a leading inventor in the semiconductor manufacturing realm, with his advancements significantly impacting thin film deposition techniques. His innovative methodologies promise to drive efficiency and quality in future semiconductor applications, ensuring continued growth and development in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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